Study of GaAs spacer layers in InAs/GaAs vertically aligned quantum dot structures

被引:6
作者
Sanguinetti, S
Padovani, M
Gurioli, M
Grilli, E
Guzzi, M
Vinattieri, A
Colocci, M
Frigeri, P
Franchi, S
Lazzarini, L
Salviati, G
机构
[1] Univ Milan, INFM, I-20125 Milan, Italy
[2] Univ Milan, Dip Sci Mat, I-20125 Milan, Italy
[3] Univ Florence, Dipartimento Fis, INFM, I-50125 Florence, Italy
[4] Univ Florence, Dipartimento Fis, LENS, I-50125 Florence, Italy
[5] CNR, MASPEC, I-43010 Parma, Italy
关键词
quantum dots; InAs; transmission electron microscopy; photoluminescence;
D O I
10.1016/S0040-6090(00)01511-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigated vertically aligned InAs/GaAs QD structures, grown by atomic layer molecular beam epitaxy, with a number N of layers and with spacer thicknesses d. QD alignment and structure quality were checked by transmission electron microscopy. The dependencies of carrier capture, decay dynamics and existence of quenching channels on the design parameters N and d were studied by lime resolved photoluminescence (PL), PL excitation (PLE) and PL temperature-dependent measurements. Our results show that the carrier capture and the radiative efficiency of the QDs are negatively affected by increasing the number of QD layers and by reducing the spacer thicknesses; this effect is likely to be related to the increase of defect concentrations in GaAs spacers, due to relaxation of an increasingly large strain. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:224 / 226
页数:3
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