Microstructure and mechanical properties of TiZrAlN nanocomposite thin films by CFUBMS

被引：15
|
作者：
Kim, Youn J. [1 ]
Lee, Ho Y. [1 ]
Byun, Tae J. [1 ]
Han, Jeon G. [1 ]
机构：
[1] Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South Korea
来源：
THIN SOLID FILMS | 2008年 / 516卷 / 11期
关键词：
TiZrAlN; nanocomposite; CFUBMS;
D O I：
10.1016/j.tsf.2007.08.056
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Quaternary TiZrAlN nanocomposite thin films were deposited by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS), and their microstructure and mechanical properties were examined. The grain refinement of the TiZrAlN nanocomposite thin films was controlled by adjusting the N-2 partial pressure. The hardness of the film varied with the N-2 partial pressure with a maximum value of approximately 47 GPa. A critical grain size, d(c), was found to be essential for maximizing the hardness. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码：3651 / 3655
页数：5
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