A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films

被引：13

作者：

Xu, Shusheng ^{[1
]}

Hu, Ming ^{[1
]}

Sun, Jiayi ^{[1
]}

Weng, Lijun ^{[1
]}

Liu, Weimin ^{[1
]}

Gao, Xiaoming ^{[1
]}

机构：

[1] Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Gansu, Peoples R China

来源：

MATERIALS LETTERS | 2018年 / 216卷

关键词：

Physical vapour deposition; Thin films; Structural; THIN-FILMS; MOS2; FILMS; GROWTH; DEPOSITION; MORPHOLOGY; BEHAVIOR;

D O I：

10.1016/j.matlet.2018.01.027

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Sputtered WS2 films can be modified by adding some amount of hetero-elements to overcome the porous columnar microstructure and thereby to enhance the wear resistance. However, the recession of tribological properties of WS2-hetero-element composite films in low earth orbit environment would be a potential danger because most hetero-elements succumbed to oxidation by atomic oxygen. Herein, by altering deposition argon pressure to adjust the plasmas bombard function on growing WS2 film, the characteristic porous microstructure disappeared. At the optimization condition, the sputtered WS2 film exhibited a dense microstructure, high ratio of S to W, and thereby much better wear-resistance. However, the excessive bombardment would result in the prominent loss of S atoms in WS2 film and the deterioration of tribological properties. (C) 2018 Elsevier B.V. All rights reserved.

引用

页码：179 / 181

页数：3

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