Molecular dynamics simulation for ionized cluster beam deposition

被引：4

作者：

Kang, HJ ^{[1
]}

Lee, MW ^{[1
]}

Kim, JH ^{[1
]}

Whang, CN ^{[1
]}

机构：

[1] YONSEI UNIV,DEPT PHYS,SEOUL 120749,SOUTH KOREA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1997年 / 121卷 / 1-4期

关键词：

ENERGY;

D O I：

10.1016/S0168-583X(96)00559-9

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The mechanism of ionized cluster beam deposition has been studied using Molecular Dynamics Simulation, The Embedded Atom Method (EAM) potential was used in the simulation. The impact of an Au-95-cluster on a Au(100) substrate was studied for impact energies of 0.15-10 eV/atom. The dependence of the impact energy of the cluster beam was observed. For a cluster energy impact of 10 eV per atom, defects on the surface were created and the cluster embedded into a substrate as an amorphous state. For an energy of 0.5 eV per atom, a defect-free homoepitaxial growth was observed and atomic-scale nucleation was formed, which are in good agreement with experiment. Thus the molecular dynamics simulation is very useful to study the mechanism of ionized cluster beam deposition.

引用

页码：53 / 57

页数：5

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