A bulk micromachined vertical nano-gap Pirani wide-range pressure test structure for packaged MEMS performance monitoring

被引：2

作者：

Kubota, Masanori ^{[1
]}

Okada, Toshihiro ^{[2
]}

Mita, Yoshio ^{[2
]}

Sugiyama, Masakazu ^{[1
]}

Nakano, Yoshiaki ^{[3
]}

机构：

[1] Univ Tokyo, Grad Sch Engn, Inst Engn Innovat, Bunkyo Ku, 2-11-16 Yayoi, Tokyo 1138656, Japan

[2] Univ Tokyo, Grad Sch Engn, Dept Elect Engn & Informat Syst, Tokyo 1138656, Japan

[3] Univ Tokyo, Res Ctr Adv Sci & Technol, Tokyo 1138656, Japan

来源：

2010 INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, 23RD IEEE ICMTS CONFERENCE PROCEEDINGS | 2010年

关键词：

D O I：

10.1109/ICMTS.2010.5466871

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A nano-gap Pirani gauge for integration with bulk MEMS sensors and actuators was fabricated by cutting-edge high aspect ratio bulk micromachining. The 150nm-wide, 5000nm-dep vertical trench enables wide-range pressure measurement; the device showed sensitity in all the tested range from 6.3 to 101.3kPa. +/- 0.27% of power variation around 35 mW was measured for +/- 1 kPa of pressure change from atmospheric pressure.

引用

页码：14 / 17

页数：4

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