Low loss titanium dioxide strip loaded waveguide on thin-film lithium niobate at 1550nm

被引：2

作者：

Zhu, Xiaofeng ^{[1
]}

Mercante, Andrew J.

Shi, Shouyuan ^{[1
]}

Peng, Yao

Prather, Dennis W.

机构：

[1] Univ Delaware, 139 Green, Newark, DE 19716 USA

来源：

OPTICAL COMPONENTS AND MATERIALS XIX | 2022年 / 11997卷

关键词：

Titanium dioxide; Thin-film lithium niobate; Reactive sputtering deposition; Low-loss waveguide; Dielectric lift-off;

D O I：

10.1117/12.2614601

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This paper presents the use of TiO2 as a strip loaded waveguide on thin-film lithium niobate (TFLN). The waveguides were fabricated by using an RF reactive sputtering deposition followed by a dielectric lift-off process. An additional layer of SiO2 was deposited as a cladding layer using a plasma-enhanced chemical vapor deposition (PECVD). To characterize this process, atomic-force-microscopy (AFM) and an ellipsometer were used. Lastly, a propagation loss of 1.26dB/cm at 1550nm was experimentally measured by Optical Backscatter reflectometry (OBR) and are presented in this paper.

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页数：6

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