Reducing electron beam damage through alternative STEM scanning strategies, Part II: Attempt towards an empirical model describing the damage process

被引:12
作者
Jannis, D.
Velazco, A.
Beche, A.
Verbeeck, J. [1 ]
机构
[1] Univ Antwerp, EMAT, Groenenborgerlaan 171, B-2020 Antwerp, Belgium
基金
欧盟地平线“2020”;
关键词
Scanning transmission electron microscopy; Electron beam damage; Scanning strategies; Diffusion process; RADIATION-DAMAGE; RESOLUTION; TEM; DEPENDENCE;
D O I
10.1016/j.ultramic.2022.113568
中图分类号
TH742 [显微镜];
学科分类号
摘要
In this second part of a series we attempt to construct an empirical model that can mimick all experimental observations made regarding the role of an alternative interleaved scan pattern in STEM imaging on the beam damage in a specific zeolite sample. We make use of a 2D diffusion model that describes the dissipation of the deposited beam energy in the sequence of probe positions that are visited during the scan pattern. The diffusion process allows for the concept of trying to 'outrun' the beam damage by carefully tuning the dwell time and distance between consecutively visited probe positions. We add a non linear function to include a threshold effect and evaluate the accumulated damage in each part of the image as a function of scan pattern details. Together, these ingredients are able to describe qualitatively all aspects of the experimental data and provide us with a model that could guide a further optimisation towards even lower beam damage without lowering the applied electron dose. We deliberately remain vague on what is diffusing here which avoids introducing too many sample specific details. This provides hope that the model can be applied also in sample classes that were not yet studied in such great detail by adjusting higher level parameters: a sample dependent diffusion constant and damage threshold.
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页数:8
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