Defects in Thin Layers of High Entropy Alloy HfNbTaTiZr

被引：4

作者：

Lukac, F. ^{[1
,2
]}

Hruska, P. ^{[2
,3
]}

Cichon, S. ^{[3
]}

Vlasak, T. ^{[2
]}

Cizek, J. ^{[2
]}

Kmjec, T. ^{[2
]}

Melikhova, O. ^{[2
]}

Butterling, M. ^{[4
]}

Liedke, M. O. ^{[4
]}

Wagner, A. ^{[4
]}

机构：

[1] Czech Acad Sci, Inst Plasma Phys, Za Slovankou 3, Prague 18200 8, Czech Republic

[2] Charles Univ Prague, Fac Math & Phys, V Holesovickach 2, Prague 18000 8, Czech Republic

[3] Czech Acad Sci, Inst Phys, Na Slovance 2, Prague 18221 8, Czech Republic

[4] Helmholtz Zentrum Dresden Rossendorf, Inst Radiat Phys, Bautzner Landstr 400, Dresden 01328, Germany

来源：

ACTA PHYSICA POLONICA A | 2020年 / 137卷 / 02期

关键词：

Thin films - Film preparation - Entropy - Textures - Zircaloy - Spark plasma sintering;

D O I：

10.12693/APhysPolA.137.219

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

High entropy alloys represent a new type of materials with unique combination of physical properties originating due to occurrence of single phase solid solution of numerous elements. Preparation of high entropy alloys films with nanosized grains promises increased effective surface and high intergranular diffusion of elements. In the present work HfNbTaTiZr films were deposited by magnetron sputtering from single phase HfNbTaTiZr target prepared by spark plasma sintering. Chemical composition of high entropy alloys thin films prepared this way was enriched in Ti and depleted in Zr and Nb. Very fine microstructure of the film was documented and defect distribution was found to be non-uniform with depth.

引用

页码：219 / 221

页数：3

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