THE INTRINSIC SUBMICRON ZNO THIN FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

被引:0
作者
Remes, Zdenek [1 ,2 ]
Stuchlik, Jiri [1 ]
Purkrt, Adam [1 ]
Chang Yu-Ying [1 ,2 ]
Jirasek, Vit [1 ]
Stenclova, Pavla [1 ]
Prajzler, Vaclav [3 ]
Nekvindova, Pavla [4 ]
机构
[1] CAS, Inst Phys, Prague, Czech Republic
[2] Czech Tech Univ, Fac Biomed Engn, Kladno, Czech Republic
[3] Czech Tech Univ, Fac Elect Engn, Prague, Czech Republic
[4] UCT, Dept Inorgan Chem, Prague, Czech Republic
来源
8TH INTERNATIONAL CONFERENCE ON NANOMATERIALS - RESEARCH & APPLICATION (NANOCON 2016) | 2017年
关键词
ZnO; reactive magnetron sputtering; plasma treatment; photothermal deflection spectroscopy; optical spectroscopy; ZINC-OXIDE; BAND-GAP;
D O I
暂无
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The DC reactive magnetron sputtering of metallic target in oxide atmosphere is a simple method of depositing the intrinsic (undoped) nanocrystalline layers of metal oxides. We have optimized the deposition of the intrinsic ZnO thin films with submicron thickness 50-500 nm on fused silica glass substrates and investigated the localized defect states below the optical absorption edge down to 0.01 % using photothermal deflection spectroscopy from UV to IR. We have shown that the defect density, the optical absorptance and the related optical attenuation in planar waveguides can be significantly reduced by annealing in air at 400 degrees C.
引用
收藏
页码:36 / 41
页数:6
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