Complex transients in power modulated inductively-coupled chlorine plasmas

被引:12
|
作者
List, Tyler [1 ]
Ma, Tianyu [1 ]
Arora, Priyanka [1 ]
Donnelly, Vincent M. [1 ]
Shannon, Steven [2 ]
机构
[1] Univ Houston, Dept Chem & Biomol Engn, Houston, TX 77204 USA
[2] North Carolina State Univ, Dept Nucl Engn, Raleigh, NC 27695 USA
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2019年 / 28卷 / 02期
关键词
pulsed plasmas; chlorine plasmas; instabilities; electronegative plasmas; capacitive to inductive transitions; H TRANSITION; INSTABILITIES; CHEMISTRY; DYNAMICS;
D O I
10.1088/1361-6595/ab000c
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Time-dependent studies of power-modulated chlorine inductively-coupled plasmas are presented. Power at 13.56 MHz applied to the plasma was modulated between high and low power states. Time-resolved optical emission, power delivery, and Langmuir probe measurements revealed at least two conditions upon switching from high to low power: a 'normal' mode in which electron temperature (T-e) remains constant, while electron and ion number densities (n(e )and n(+)) and optical emission spectroscopic (OES) intensities smoothly drop to a level roughly equal to the fractional drop in power, and an 'abnormal' mode in which n(e), n(+) and OES intensities plummet before the plasma re-ignites and these values rise to levels more commensurate with the drop in power. Whether the plasma operates in the normal or abnormal mode is sensitive to impedance matching conditions and is also a function of pressure and pulsing parameters. This ignition delays in the abnormal mode can be qualitatively understood in terms of a power balance model commonly used to explain instability-induced, self-modulation in highly electronegative plasmas, caused by the slower time response of negative ions compared with electrons. The study indicates that power modulation for added control in processes such as plasma etching will require careful measurement and possibly control of power with microsecond resolution.
引用
收藏
页数:14
相关论文
共 50 条
  • [21] Discharge profiles of internal-antenna-driven inductively-coupled plasmas
    Setsuhara, Yuichi
    Sera, Takashi
    Takenaka, Kosuke
    SURFACE & COATINGS TECHNOLOGY, 2008, 202 (22-23): : 5234 - 5237
  • [22] Measurements of pulsed-power modulated argon plasmas in an inductively coupled plasma source
    Ashida, S
    Shim, MR
    Lieberman, MA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (02): : 391 - 397
  • [23] FUNDAMENTAL-STUDIES OF MIXED-GAS INDUCTIVELY-COUPLED PLASMAS
    SESI, NN
    MACKENZIE, A
    SHANKS, KE
    YANG, PY
    HIEFTJE, GM
    SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1994, 49 (12-14) : 1259 - +
  • [24] Production of inductively-coupled large-diameter plasmas with internal antenna
    Setsuhara, Y
    Miyake, S
    Sakawa, Y
    Shoji, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (7B): : 4263 - 4267
  • [25] A multilevel inverter topology for inductively-coupled power transfer
    Rodriguez, JI
    Leeb, SB
    APEC 2003: EIGHTEENTH ANNUAL IEEE APPLIED POWER ELECTRONICS CONFERENCE AND EXPOSITION, VOLS 1 AND 2, 2003, : 1118 - 1126
  • [26] Production of inductively-coupled large-diameter plasmas with internal antenna
    Setsuhara, Yuichi
    Miyake, Shoji
    Sakawa, Yoichi
    Shoji, Tatsuo
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (7 B): : 4263 - 4267
  • [27] Pulsed inductively coupled chlorine plasmas in the presence of a substrate bias
    Subramonium, P
    Kushner, MJ
    APPLIED PHYSICS LETTERS, 2001, 79 (14) : 2145 - 2147
  • [28] Etching of SiC in Low Power Inductively-Coupled Plasma
    Osipov A.A.
    Aleksandrov S.E.
    Solov’ev Y.V.
    Uvarov A.A.
    Osipov A.A.
    Osipov, A.A. (tema.osipov@mail.ru), 2018, Pleiades journals (47) : 427 - 433
  • [29] Power matching to pulsed inductively coupled plasmas
    Qu, Chenhui
    Lanham, Steven J.
    Shannon, Steven C.
    Nam, Sang Ki
    Kushner, Mark J.
    JOURNAL OF APPLIED PHYSICS, 2020, 127 (13)
  • [30] Nonlocal power deposition in inductively coupled plasmas
    Evans, JD
    Chen, FF
    PHYSICAL REVIEW LETTERS, 2001, 86 (24) : 5502 - 5505