Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Environments

被引:1
作者
Niibe, Masahito [1 ]
Koida, Keigo [1 ,3 ]
Kakutani, Yukinobu [1 ,3 ]
Nakayama, Takahiro [2 ]
Terashima, Shigeru [2 ]
Miyake, Akira [2 ]
Kubo, Hiroyoshi [2 ]
Matsunari, Shuichi [3 ]
Aoki, Takashi [3 ]
Kawata, Shintaro [3 ]
机构
[1] Univ Hyogo, Lab Adv Sci & Technol Ind, Kamigori, Hyogo 6781205, Japan
[2] Canon Inc, Nanotechnol Dev Ctr, Utsunomiya, Tochigi 3213298, Japan
[3] Nikon Inc, Precis Equipment Co, Sagamihara, Kanagawa 2280828, Japan
关键词
CAPPING LAYERS; CONTAMINATION; OXIDATION;
D O I
10.1143/JJAP.50.06GB05
中图分类号
O59 [应用物理学];
学科分类号
摘要
To estimate the optics lifetime of an extreme ultraviolet lithography (EUVL) system with a contaminated mirror surface, it is indispensable to carry out an acceleration test using high-flux EUV irradiation. In this study, Mo/Si multilayer mirrors were irradiated in various vacuum environments using a contamination evaluation system with an undulator light source, and changes in their reflectivity were evaluated. The dependence of the decrease in reflectivity per unit dose on the EUV irradiance was observed in high-flux irradiation experiments in vacuum with water vapor or n-decane gas introduction at pressures lower than about 10(-5) Pa. The irradiance dependence disappeared when the pressures were increased for both water vapor and decane gas. A reflectivity distribution with a doughnut shape, namely, high at the irradiation center, low in the surrounding area, and high in the non-irradiated area, was observed in the irradiation experiments during the simultaneous introduction of water vapor and decane gas. These results can be generally explained by the mechanism of the supply-controlled limit. (C) 2011 The Japan Society of Applied Physics
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页数:6
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