In this work, we study electron transport across the heterojunction interface of epitaxial few-layer graphene grown on silicon carbide and the underlying substrate. The observed Schottky barrier is characterized using current-voltage, capacitance-voltage and photocurrent spectroscopy techniques. It is found that the graphene/SiC heterojunction cannot be characterized by a single unique barrier height because of lateral barrier inhomogeneities. A Gaussian distribution of barrier heights with a mean barrier height phi(Bm) - 1.06 eV and standard deviation sigma - 137 +/- 11 meV explains the experimental data quite well. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4711769]
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Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Hofmann, T.
Boosalis, A.
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Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Boosalis, A.
Kuehne, P.
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Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Kuehne, P.
Herzinger, C. M.
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JA Woollam Co Inc, Lincoln, NE 68508 USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Herzinger, C. M.
Woollam, J. A.
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JA Woollam Co Inc, Lincoln, NE 68508 USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Woollam, J. A.
Gaskill, D. K.
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USN, Res Lab, Washington, DC 20375 USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Gaskill, D. K.
Tedesco, J. L.
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USN, Res Lab, Washington, DC 20375 USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Tedesco, J. L.
Schubert, M.
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Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
机构:
Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Hofmann, T.
Boosalis, A.
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机构:
Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Boosalis, A.
Kuehne, P.
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机构:
Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Kuehne, P.
Herzinger, C. M.
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机构:
JA Woollam Co Inc, Lincoln, NE 68508 USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Herzinger, C. M.
Woollam, J. A.
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JA Woollam Co Inc, Lincoln, NE 68508 USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Woollam, J. A.
Gaskill, D. K.
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USN, Res Lab, Washington, DC 20375 USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Gaskill, D. K.
Tedesco, J. L.
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h-index: 0
机构:
USN, Res Lab, Washington, DC 20375 USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Tedesco, J. L.
Schubert, M.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE USAUniv Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA