Sputter deposition of tungsten trioxide for gas sensing applications

被引:28
作者
Di Giulio, M [1 ]
Manno, D [1 ]
Micocci, G [1 ]
Serra, A [1 ]
Tepore, A [1 ]
机构
[1] Univ Lecce, Dipartimento Sci Mat, I-73100 Lecce, Italy
关键词
D O I
10.1023/A:1008889009741
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Tungsten trioxide thin films were grown by reactively sputtering a circular WO3 target in different Ar-O-2 atmospheres. After deposition, data an the structural, optical and electrical properties were obtained by using transmission electron microscopy (TEM) to examine the structure and the morphology of the films, UV-VIS spectrophotometry to determine optical absorption edge characteristics, and Hall effect measurements to determine the change carrier mobility and the film resistivity. In addition, the film resistance variations in controlled atmospheres were examined and the gas sensing properties of films grown under different conditions were compared. The aim of the study was to examine the effect of O-2 concentration in the sputtering atmosphere on structural, optical, electrical and sensing properties. (C) 1998 Kluwer Academic Publishers.
引用
收藏
页码:317 / 322
页数:6
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