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SiH monolayer: A promising two-dimensional thermoelectric material
被引:13
|作者:
Wani, Aadil Fayaz
[1
]
Rani, Bindu
[1
]
Dhiman, Shobhna
[1
]
Sharopov, Utkir Bahodirovich
[2
]
Kaur, Kulwinder
[1
]
机构:
[1] Punjab Engn Coll Deemed Univ, Dept Appl Sci, Chandigarh 160012, India
[2] Uzbek Acad Sci, Solar Thermal & Power Plants Lab, Phys Tech Inst, Tashkent, Uzbekistan
关键词:
2D materials;
density functional theory;
electronic structure;
figure of merit;
MD simulation;
phonon dispersion;
seebeck coefficient;
thermal conductivity;
ELECTRONIC-PROPERTIES;
6;
X;
PERFORMANCE;
LAYER;
D O I:
10.1002/er.7889
中图分类号:
TE [石油、天然气工业];
TK [能源与动力工程];
学科分类号:
0807 ;
0820 ;
摘要:
Stability and dynamics of structure, mechanical and thermoelectric properties of SiH monolayer have been reported in this work. After confirming the stability apprehensions, electronic structure calculations present the SiH as an indirect semiconducting monolayer with a bandgap of 2.19 eV. Calculations on elastic constant, deformation potential constant, effective mass, relaxation time, and mobility of charge carriers have been done to get the exact value of thermoelectric parameters. We analysed the variation of Seebeck coefficient, electrical conductivity and electronic thermal conductivity with respect to chemical potential at different temperatures and found that the high value of Seebeck coefficient and electrical conductivity along with low electronic thermal conductivity leads to a high value of Z(e)T. 2.185. SiH monolayer is being reported for the first time as a thermoelectric material and calculated thermoelectric properties show that SiH monolayer can be used efficiently in the field of thermoelectricity.
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页码:10885 / 10893
页数:9
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