Application of dopant segregation to metal-germanium-metal photodetectors and its dark current suppression mechanism

被引:15
作者
Zang, H. [1 ,2 ]
Lee, S. J. [1 ]
Loh, W. Y. [2 ]
Wang, J. [2 ]
Yu, M. B. [2 ]
Lo, G. Q. [2 ]
Kwong, D. L. [2 ]
Cho, B. J. [1 ]
机构
[1] Natl Univ Singapore, ECE Dept, Silicon Nano Devices Lab, Singapore 117576, Singapore
[2] Inst Microelect, ASTAR, Singapore 117685, Singapore
关键词
D O I
10.1063/1.2841061
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the mechanism of dopant-segregation (DS) technique as applied in metal-germanium-metal photodetectors (MGM-PDs) for dark current suppression. Photodetectors with various dopant-segregation strategies were designed, fabricated, and characterized. Results show that asymmetric MGM-PD, with n- and p-type dopants segregated separately in two NiGe electrodes, is the optimized scheme in terms of dark current and responsivity. It shows a dark current of 10(-6) A at -1 V, which is two to three orders of magnitude lower than that of MGM-PD without DS. n-type dopant (As) segregation in NiGe barrier increases the hole Schottky barrier height to 0.5 eV and, thus, plays a crucial role in dark current suppression. (C) 2008 American Institute of Physics.
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页数:3
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