Characterization of short-wavelength-selective a-Si:H MSM photoconductors for large-area digital-imaging applications

被引:18
作者
Taghibakhsh, Farhad [1 ]
Khodami, Ida [1 ]
Karim, Karim S. [1 ]
机构
[1] Univ Waterloo, Dept Elect & Comp Engn, Waterloo, ON N2L 3G1, Canada
基金
加拿大创新基金会; 加拿大自然科学与工程研究理事会;
关键词
amorphous silicon (a-Si); metal-semiconductor-metal (MSM) devices; photoconducting devices; photodetectors;
D O I
10.1109/TED.2007.911094
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Photoconductor-type photodetectors are attractive as sensors due to their compatibility with thin-film-transistor (TFT) fabrication processes. Since they exhibit photogain, photoconductor detectors have better or comparable responsivity and quantum efficiency (QE) compared to p-i-n photodiodes. In this paper, the operation of metal-semiconductor-metal photoconductor-based photodetectors using aluminum electrodes and thin hydrogenated amorphous-silicon (a-Si) films is investigated. The experimental results of photocurrent measurements, as well as the responsivity and QE for different a-Si film thicknesses, bias voltages, and electrode gaps, are presented. Integration with TFT fabrication and its application in large-area digital imaging are discussed.
引用
收藏
页码:337 / 342
页数:6
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