An alternative route towards micro- and nano-patterning of oxide films

被引：22

作者：

Bridoux, G. ^{[1
]}

Barzola-Quiquia, J. ^{[1
]}

Bern, F. ^{[1
]}

Boehlmann, W. ^{[1
]}

Vrejoiu, I. ^{[2
]}

Ziese, M. ^{[1
]}

Esquinazi, P. ^{[1
]}

机构：

[1] Univ Leipzig, Div Superconduct & Magnetism, D-04103 Leipzig, Germany

[2] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany

来源：

NANOTECHNOLOGY | 2012年 / 23卷 / 08期

关键词：

ANISOTROPY;

D O I：

10.1088/0957-4484/23/8/085302

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This paper presents a method to obtain submicron- and nanometer structures of different oxide films and heterostructures combining e-beam lithography and chemical etching. The most relevant advantage of this method is that structures of tens of microns in length and below similar to 100 nm width can be produced, keeping the intrinsic bulk film properties, as proven by electrical transport measurements. In this way our method provides a bridge that connects the attractive properties of oxide films and the nanoworld.

引用

页数：7

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