Dynamics of below-band-gap carrier in highly excited GaN

被引:1
作者
Guo, B
Wong, KS
Ye, ZZ
Jiang, HX
Lin, JY
机构
[1] Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R China
[2] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
[3] Kansas State Univ, Dept Phys, Manhattan, KS 66506 USA
关键词
D O I
10.1088/0256-307X/20/5/345
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Femtosecond time-resolved reflectivity was used to investigate below-band-gap (3.1 eV) carrier dynamics in a nominally undoped GaN epilayer under high excitation. A 2.5-ps rising process can be observed in the transient trace. This shot rising time results from the hot phonon effects which can cause a delayed energy relaxation of the initial photocarriers toward the band edge. From the density dependence of the carrier dynamics, the Mott density was estimated to be 1.51-1.56 x 10(19) cm(-3). Below the Mott density, the initial probed carrier dynamics was explained to the effect of acoustic phonon-assisted tunnelling for localized states, where a significant excitation density dependence of the tunnelling probability was observed due to the optically induced bandtail extension to lower energies. Above the Mott density, the measured carrier dynamics reflected the relaxation of an electron-hole plasma, in which a distinct fast decay component of 2.3ps was observed due to the onset of nonlinear relaxation processes such Auger recombination.
引用
收藏
页码:749 / 752
页数:4
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