Investigation of the Switching Mechanism in TiO2-Based RRAM: A Two-Dimensional EDX Approach

被引:72
作者
Carta, Daniela [1 ]
Salaoru, Iulia [1 ]
Khiat, Ali [1 ]
Regoutz, Anna [1 ]
Mitterbauer, Christoph [2 ]
Harrison, Nicholas M. [3 ]
Prodromakis, Themistoklis [1 ]
机构
[1] Univ Southampton, Nano Grp, Southampton Nanofabricat Ctr, Dept Elect & Comp Sci, Southampton SO17 1BJ, Hants, England
[2] FEI Co, POB 80066, NL-5600 KA Eindhoven, Netherlands
[3] Imperial Coll London, Dept Chem, Exhibit Rd, London SW7 2AZ, England
基金
英国工程与自然科学研究理事会;
关键词
resistive memory; titanium dioxide; memristors; energy dispersive X-ray spectroscopy; thin films; resistive switching; RESISTIVE SWITCHES; MEMORY; TEMPERATURE; IMPROVEMENT; DIFFUSION; TITANIUM; RERAM; OXIDE;
D O I
10.1021/acsami.6b04919
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The next generation of nonvolatile memory storage may well be based on resistive switching in metal oxides. TiO2 as transition metal oxide has been widely used as active layer for the fabrication of a variety of multistate memory nanostructure devices. However, progress in their technological development has been inhibited by the lack of a thorough understanding of the underlying switching mechanisms. Here, we employed high-angle annular dark field scanning transmission electron microscopy (HAADF-STEM) combined with two-dimensional energy dispersive X-ray spectroscopy (2D EDX) to provide a novel, nanoscale view of the mechanisms involved. Our results suggest that the switching mechanism involves redistribution of both Ti and O ions within the active layer combined with an overall loss of oxygen that effectively render conductive filaments. Our study shows evidence of titanium movement in a 10 nm TiO2 thin-film through direct EDX mapping that provides a viable starting point for the improvement of the robustness and lifetime of TiO2-based resistive random access memory (RRAM).
引用
收藏
页码:19605 / 19611
页数:7
相关论文
共 40 条
[11]   A nonvolatile programmable solid-electrolyte nanometer switch [J].
Kaeriyama, S ;
Sakamoto, T ;
Sunamura, H ;
Mizuno, M ;
Kawaura, H ;
Hasegawa, T ;
Terabe, K ;
Nakayama, T ;
Aono, M .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2005, 40 (01) :168-176
[12]   Electrical observations of filamentary conductions for the resistive memory switching in NiO films [J].
Kim, D. C. ;
Seo, S. ;
Ahn, S. E. ;
Suh, D. -S. ;
Lee, M. J. ;
Park, B. -H. ;
Yoo, I. K. ;
Baek, I. G. ;
Kim, H. -J. ;
Yim, E. K. ;
Lee, J. E. ;
Park, S. O. ;
Kim, H. S. ;
Chung, U-In ;
Moon, J. T. ;
Ryu, B. I. .
APPLIED PHYSICS LETTERS, 2006, 88 (20)
[13]   Nanofilamentary resistive switching in binary oxide system; a review on the present status and outlook [J].
Kim, Kyung Min ;
Jeong, Doo Seok ;
Hwang, Cheol Seong .
NANOTECHNOLOGY, 2011, 22 (25)
[14]   A low-power nonvolatile switching element based on copper-tungsten oxide solid electrolyte [J].
Kozicki, Michael N. ;
Gopalan, Chakravarthy ;
Balakrishnan, Muralikrishnan ;
Mitkova, Maria .
IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2006, 5 (05) :535-544
[15]   Local Temperature Redistribution and Structural Transition During Joule-Heating-Driven Conductance Switching in VO2 [J].
Kumar, Suhas ;
Pickett, Matthew D. ;
Strachan, John Paul ;
Gibson, Gary ;
Nishi, Yoshio ;
Williams, R. Stanley .
ADVANCED MATERIALS, 2013, 25 (42) :6128-6132
[16]  
Kwon DH, 2010, NAT NANOTECHNOL, V5, P148, DOI [10.1038/NNANO.2009.456, 10.1038/nnano.2009.456]
[17]   Oxygen Vacancy Creation, Drift, and Aggregation in TiO2-Based Resistive Switches at Low Temperature and Voltage [J].
Kwon, Jonghan ;
Sharma, Abhishek A. ;
Bain, James A. ;
Picard, Yoosuf N. ;
Skowronski, Marek .
ADVANCED FUNCTIONAL MATERIALS, 2015, 25 (19) :2876-2883
[18]  
Lee MJ, 2011, NAT MATER, V10, P625, DOI [10.1038/NMAT3070, 10.1038/nmat3070]
[19]   Insights into Nanoscale Electrochemical Reduction in a Memristive Oxide: the Role of Three-Phase Boundaries [J].
Lenser, Christian ;
Patt, Marten ;
Menzel, Stephan ;
Koehl, Annemarie ;
Wiemann, Carsten ;
Schneider, Claus M. ;
Waser, Rainer ;
Dittmann, Regina .
ADVANCED FUNCTIONAL MATERIALS, 2014, 24 (28) :4466-4472
[20]   Memory Impedance in TiO2 based Metal-Insulator-Metal Devices [J].
Li Qingjiang ;
Khiat, Ali ;
Salaoru, Iulia ;
Papavassiliou, Christos ;
Hui, Xu ;
Prodromakis, Themistoklis .
SCIENTIFIC REPORTS, 2014, 4