Monte Carlo modeling of secondary electron emission and its incorporation in particle simulations of electron-surface interaction

被引:4
作者
Cheng, Guoxin [1 ]
Liu, Lie [1 ]
机构
[1] Natl Univ Def Technol, Coll Optoelect Sci & Engn, Changsha 410073, Hunan, Peoples R China
基金
中国国家自然科学基金;
关键词
Secondary electron emission; Particle simulation; Leap-frog integrator; Electron-surface interaction; MAGNETIC-FIELD; MULTIPACTOR; ALGORITHMS; DISCHARGE; INJECTION;
D O I
10.1016/j.cpc.2011.03.002
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
Based on Vaughan's empirical formula of secondary emission yield and the assumption of mutual exclusion of each type of secondary electron, a mathematically self-consistent secondary emission model is proposed. It identifies each generated secondary electron as either elastic reflected, rediffused, or true secondary, hence, it allows the use of distinct emission energy and angular distributions of each type of electron. Monte Carlo modeling of the developed model is presented, and second-order algorithms for particle collection and ejection at the secondary-emission wall are developed in order to incorporate the secondary electron emission process in the standard leap-frog integrator. The accuracy of these algorithms is analyzed for general fields and is confirmed by comparing the numerically computed values with the exact solution under a homogeneous magnetic field. In particular, the phenomenon of multipactor electron discharge on a dielectric is simulated to verify the usefulness of the model developed in this paper. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:1295 / 1303
页数:9
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