Step and Flash Imprint Lithography for Manufacturing Patterned Media

被引：10

作者：

Brooks, Cynthia ^{[1
]}

Schmid, Gerard M. ^{[1
]}

Miller, Mike ^{[1
]}

Johnson, Steve ^{[1
]}

Khusnatdinov, Niyaz ^{[1
]}

LaBrake, Dwayne ^{[1
]}

Resnick, Douglas J. ^{[1
]}

Sreenivasan, S. V. ^{[1
]}

机构：

[1] Mol Imprints Inc, Austin, TX 78758 USA

来源：

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES | 2009年 / 7271卷

关键词：

step and flash imprint lithography; S-FIL; template; imprint; patterned media; MAGNETIC RECORDING MEDIA; RESOLUTION;

D O I：

10.1117/12.815016

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The ever-growing demand for hard drives with greater storage density has motivated a technology shift from continuous magnetic media to patterned media hard disks, which are expected to be implemented in future generations of hard disk drives to provide data storage at densities exceeding 1012 bits per square inch. Step and Flash Imprint Lithography (S-FIL) technology has been employed to pattern the hard disk substrates. This paper discusses the infrastructure required to enable S-FIL in high-volume manufacturing; namely, fabrication of master templates, template replication, high-volume imprinting with precisely controlled residual layers, and dual-sided imprinting. Imprinting of disks is demonstrated with substrate throughput currently as high as 180 disks/hour (dual-sided). These processes are applied to patterning hard disk substrates with both discrete tracks and bit-patterned designs.

引用

页数：12

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