Low-temperature oxidation of CoCu films with long-term irradiation by oxygen ion beams

被引:3
|
作者
Stognij, AI [1 ]
Koryakin, SV [1 ]
Virchenko, VA [1 ]
机构
[1] Belarussian Acad Sci, Inst Solid State & Semicond Phys, Minsk 220072, BELARUS
关键词
Spectroscopy; Thin Film; Cobalt; Surface Layer; Oxide Layer;
D O I
10.1134/1.1379643
中图分类号
O59 [应用物理学];
学科分类号
摘要
The surface and surface layers of CoxCu100-x inhomogeneous thin films irradiated by an oxygen ion beam for a long time (to 100 min) are studied. The films are obtained by electrolytic deposition. With X-ray photoelectron spectroscopy and conversion electron Mossbauer spectroscopy, it is shown that the irradiation leads to the formation of an oxidized surface layer. The continuity and thickness of the layer depend on the roughness of the initial film. For a cobalt content of 8 less than or equal to x less than or equal to 20 at. %, the oxide layer is continuous and nonuniform. in thickness, the mean thickness being estimated at several tens of nanometers. The interface between the layer and the underlying film is sharp. The films irradiated are smoother than the as-deposited ones. The formation of the oxide layer is treated in terms of a qualitative model. (C) 2001 MAIK "Nauka/Interperiodica".
引用
收藏
页码:729 / 735
页数:7
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