Mg-doped high-quality AlxGa1-xN (x=0-1) grown by high-temperature metal-organic vapor phase epitaxy

被引:24
作者
Imura, M. [1 ]
Kato, N. [1 ]
Okada, N. [1 ]
Balakrishnan, K. [1 ]
Iwaya, M. [1 ]
Kamiyama, S. [1 ]
Amano, H. [1 ]
Akasaki, I. [1 ]
Noro, T. [2 ]
Takagi, T. [2 ]
Bandoh, A. [3 ]
机构
[1] Meijo Univ, Fac Sci & Technol, 21st COE Nano Factory, Tempaku Ku, 1-501 Shiogamaguchi, Nagoya, Aichi 4688502, Japan
[2] IBIDEN Co Ltd, Gifu 5038503, Japan
[3] Showa Denko K K, Chiba 2670056, Japan
来源
PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 4 NO 7 2007 | 2007年 / 4卷 / 07期
关键词
D O I
10.1002/pssc.200674880
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We report on the growth of Mg-doped AlxGa1-xN alloys and characterization of their optical properties. Under the low Mg concentration in the range 2 x 10(17) to 1 x 10(18) cm(-3) of AlxGa1-xN, the activation energy of Mg acceptor became higher and higher with increase in the Al content of AlxGa1-xN. The experimental results for activation energies of Mg acceptor fitted quite well with the hydrogen atom like model. By the Haynes' rule, relationship between bound-excition energy and activation energy of Mg acceptor was investigated, which coincided with our experimental results. (c) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:2502 / +
页数:2
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