Cathodic electrodeposition and analysis of SnS films for photoelectrochemical cells

被引:117
作者
Subramanian, B
Sanjeeviraja, C [1 ]
Jayachandran, M
机构
[1] Alagappa Univ, Dept Phys, Karaikudi 630003, Tamil Nadu, India
[2] Cent Electrochem Res Inst, Karaikudi 630003, Tamil Nadu, India
关键词
cathodic electrodeposition; photoelectrochemical cells; tin sulfide; thin films;
D O I
10.1016/S0254-0584(00)00526-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin films of p-SnS were cathodically electrodeposited on tin oxide conducting glass substrates from aqueous solution containing SnCl2 and Na2S2O3. The mechanism of electrochemical co-deposition of tin and sulphur is investigated by cyclic voltammetry. Deposits have been characterised with X-ray diffractograms,, microstructure analysis, chemical analysis, optical and electrical measurements. The films were found to be polycrystalline with an optical. energy gap of 1.15eV. Mott-Schottky plot has been drawn tin the dark condition) to evaluate the semiconductor parameters. A photoelectrochemical cell with the configuration of p-SnSIFe3+, Fe2+IPt yielded a short-circuit current density of 0.65 mA cm(-2), an open-circuit voltage of 320 mV under 100 mW cm(-2) illumination. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:40 / 46
页数:7
相关论文
共 18 条