Ab initio molecular dynamics simulations of low energy recoil events in ceramics

被引:21
作者
Gao, F. [1 ]
Xiao, H. Y. [2 ]
Weber, W. J. [2 ,3 ]
机构
[1] Pacific NW Natl Lab, Richland, WA 99352 USA
[2] Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA
[3] Oak Ridge Natl Lab, Mat Sci & Technol Div, Oak Ridge, TN 37831 USA
关键词
Ab initio MD; Threshold displacement energy; Defects; Ceramics; THRESHOLD DISPLACEMENT; DEFECT; IRRADIATION; DAMAGE; STATE; GAN;
D O I
10.1016/j.nimb.2011.01.131
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The recent progress in the use of large-scale ab initio molecular dynamics (AIMD) to investigate low energy recoil events and determine threshold displacement energies, E-d, in ceramics is reviewed. In general, E-d shows a significant dependence on recoil direction and atom. In 3C-SiC, the minimum E-d for both C and Si atoms is found along the < 1 0 0 > direction, with a value of 20 and 49 eV, respectively. The results demonstrate that significant charge transfer occurs during the dynamics process, and defects can enhance charge transfer to surrounding atoms, which provides important insights into the formation of charged defects. It is found that the C vacancy is a positively charged defect, whereas the Si vacancy is in its neutral state. The minimum E-d in GaN is determined to be 17 and 39 eV for N and Ga atoms, respectively, both along the <(1) over bar 0 1 0 > direction. The average E-d for N atoms (32.4 eV) is smaller than that for Ga atoms (73.2 eV). It is of interest to note that the N defects created along different crystallographic directions have a similar configuration (a N-N dumbbell configuration), but various configurations for Ga defects are formed. In Y2Ti2O7 prochlore, the minimum E-d for Y atoms is determined to be 27 eV for a recoil along the < 1 0 0 > direction, 31.5 eV for Ti atoms along the < 1 0 0 > direction, 14.5 eV for O-48f atoms along the < 1 1 0 > direction and 13 eV for O-gb atoms along the < 1 1 1 > direction. The average E-d values determined are 32.7, 34.2, 14.2 and 16.1 eV for yttrium, titanium, O-48f and O-gb atoms, respectively. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:1693 / 1697
页数:5
相关论文
共 37 条
  • [1] [Anonymous], HDB PHYS CHEM
  • [2] The primary damage state in fcc, bcc and hcp metals as seen in molecular dynamics simulations
    Bacon, DJ
    Gao, F
    Osetsky, YN
    [J]. JOURNAL OF NUCLEAR MATERIALS, 2000, 276 (01) : 1 - 12
  • [3] Simulation of displacement cascades in Fe90Cr10 using a two band model potential
    Bjoerkas, C.
    Nordlund, K.
    Malerba, L.
    Terentyev, D.
    Olsson, P.
    [J]. JOURNAL OF NUCLEAR MATERIALS, 2008, 372 (2-3) : 312 - 317
  • [4] Molecular dynamic simulation of disorder induced amorphization in pyrochlore
    Chartier, A
    Meis, C
    Crocombette, JP
    Weber, WJ
    Corrales, LR
    [J]. PHYSICAL REVIEW LETTERS, 2005, 94 (02)
  • [5] Atomistic modeling of displacement cascades in La2Zr2O7 pyrochlore -: art. no. 174102
    Chartier, A
    Meis, C
    Crocombette, JP
    Corrales, LR
    Weber, WJ
    [J]. PHYSICAL REVIEW B, 2003, 67 (17)
  • [6] Displacement energy surface in 3C and 6H SiC
    Devanathan, R
    Weber, WJ
    [J]. JOURNAL OF NUCLEAR MATERIALS, 2000, 278 (2-3) : 258 - 265
  • [7] POINT-DEFECT AND THRESHOLD DISPLACEMENT ENERGIES IN NI3AL .2. EVENTS AT THE DISPLACEMENT THRESHOLD
    GAO, F
    BACON, DJ
    [J]. PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1993, 67 (02): : 289 - 306
  • [8] Cascade overlap and amorphization in 3C-SiC: Defect accumulation, topological features, and disordering
    Gao, F
    Weber, WJ
    [J]. PHYSICAL REVIEW B, 2002, 66 (02) : 1 - 10
  • [9] Defect-Enhanced Charge Transfer by Ion-Solid Interactions in SiC using Large-Scale Ab Initio Molecular Dynamics Simulations
    Gao, Fei
    Xiao, Haiyan
    Zu, Xiaotao
    Posselt, Matthias
    Weber, William J.
    [J]. PHYSICAL REVIEW LETTERS, 2009, 103 (02)
  • [10] Improvement of photocatalytic activity of titanate pyrochlore Y2Ti2O7 by addition of excess Y
    Higashi, M
    Abe, R
    Sayama, K
    Sugihara, H
    Abe, Y
    [J]. CHEMISTRY LETTERS, 2005, 34 (08) : 1122 - 1123