Aqueous dip-coating route to dense and porous silica thin films using silica nanocolloids with an aid of polyvinylpyrrolidone

An aqueous dip-coating route without using volatile alcohols for preparing dense and porous silica thin films is presented. The films were prepared by dip-coating on Si(100) and silica glass substrates using aqueous suspension of 8-11 nm colloidal silica where no alcohols were added. The addition of polyvinylpyrrolidone (PVP) in the suspension greatly improved the wettability, allowing homogeneous films to be formed on the substrates while the substrates showed poor wettability without PVP. When the as-deposited films were fired at 500-1,000 A degrees C, optically transparent porous films with smooth surface were obtained. The porous films had homogeneous distribution and packing of silica nanoparticles, refractive indices of 1.24-1.33, and pencil hardness lower than 6B. The porous films underwent significant densification by viscous sintering when fired at temperatures over 1,000 A degrees C. The viscous sintering was accompanied by the progress of condensation reaction and by the structural relaxation of siloxane network, which was revealed in the infrared absorption spectra. The resulting dense films had optical transparency, smooth surface, pencil hardness over 9H and refractive indices close to that of silica glass.