Microphotonic parabolic light directors fabricated by two-photon lithography

被引：74

作者：

Atwater, J. H. ^{[1
]}

Spinelli, P. ^{[1
]}

Kosten, E. ^{[2
]}

Parsons, J. ^{[1
]}

Van Lare, C. ^{[1
]}

Van de Groep, J. ^{[1
]}

de Abajo, J. Garcia ^{[3
]}

Polman, A. ^{[1
]}

Atwater, H. A. ^{[2
]}

机构：

[1] FOM Inst AMOLF, Ctr Nanophoton, NL-1098 XG Amsterdam, Netherlands

[2] CALTECH, Thomas J Watson Lab Appl Phys, Pasadena, CA 91125 USA

[3] IO CSIC, Madrid 28006, Spain

来源：

APPLIED PHYSICS LETTERS | 2011年 / 99卷 / 15期

基金：

美国能源部;

关键词：

ion beam lithography; light emitting diodes; light transmission; microfabrication; micro-optics; optical elements; optical fabrication; ray tracing; solar cells; thin films; two-photon processes;

D O I：

10.1063/1.3648115

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have fabricated microphotonic parabolic light directors using two-photon lithography, thin-film processing, and aperture formation by focused ion beam lithography. Optical transmission measurements through upright parabolic directors 22 mu m high and 10 mu m in diameter exhibit strong beam directivity with a beam divergence of 5.6 degrees, in reasonable agreement with ray-tracing and full-field electromagnetic simulations. The results indicate the suitability of microphotonic parabolic light directors for producing collimated beams for applications in advanced solar cell and light-emitting diode designs. (C) 2011 American Institute of Physics. [doi:10.1063/1.3648115]

引用

页数：3

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