Optical properties of GaAs/AlxGa1-xAs superlattice are studied dependent on quantum well thickness of gain region and doping density of injector layers underperformed electric field. Conduction band alignment of the superlattice is obtained by using effective mass approximation. 1d-Schrodinger formula is solved by using FDM. Intersubband transition energies, linear (nonlinear and total) absorption coefficients and linear (nonlinear and total) refractive index changes are plotted under applied electric field intensity. Intersubband transition energy of electron from second excited state to first excited state shows 147 meV. It is found that -45 kV/cm electric field intensity and 5 nm layer thickness of last quantum well of the gain region are the best values for studied structure. After that, linear absorption coefficient is investigated dependent on carrier number in the injector region under electric field. It is found that carrier number over 5 x 10(16) cm(-2) can causes huge internal absorption of the radiative emission obtained in gain region due to increase in linear absorption coefficient by factor 10. As a conclusion, total absorption coefficient and total refractive index change are calculated for optimized parameters.
机构:
Osaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, JapanOsaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
Ando, M
Nakayama, M
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机构:Osaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
Nakayama, M
Nishimura, H
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机构:Osaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
Nishimura, H
Fujiwara, K
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机构:Osaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Xiong, D. -Y.
Wang, J. -Q.
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机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
机构:
Osaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, JapanOsaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
Ando, M
Nakayama, M
论文数: 0引用数: 0
h-index: 0
机构:Osaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
Nakayama, M
Nishimura, H
论文数: 0引用数: 0
h-index: 0
机构:Osaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
Nishimura, H
Fujiwara, K
论文数: 0引用数: 0
h-index: 0
机构:Osaka City Univ, Fac Engn, Dept Appl Phys, Sumiyoshi Ku, Osaka 5588585, Japan
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Xiong, D. -Y.
Wang, J. -Q.
论文数: 0引用数: 0
h-index: 0
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China