共 11 条
- [3] Jiao X., 2008, APPL PHYS A, V94, P627
- [4] Selective etching characteristics of the AgInSbTe phase-change film in laser thermal lithography [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2012, 107 (01): : 221 - 225
- [8] MECHANISM OF RESIST PATTERN COLLAPSE DURING DEVELOPMENT PROCESS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12B): : 6059 - 6064
- [9] High-speed maskless nanolithography with visible light based on photothermal localization [J]. SCIENTIFIC REPORTS, 2017, 7
- [10] Mixture of ZEP and PMMA with varying ratios for tunable sensitivity as a lift-off resist with controllable undercut [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2016, 34 (06):