Growth of rutile TiO2 nanorods on TiO2 seed layer deposited by electron beam evaporation

被引：43

作者：

Tamilselvan, V. ^{[1
]}

Yuvaraj, D. ^{[1
]}

Kumar, R. Rakesh ^{[1
]}

Rao, K. Narasimha ^{[1
]}

机构：

[1] Indian Inst Sci, Dept Instrumentat & Appl Phys, Bangalore 560012, Karnataka, India

来源：

APPLIED SURFACE SCIENCE | 2012年 / 258卷 / 10期

关键词：

Titanium dioxide; Hydrothermal crystal growth; UV absorption; Hydrophobic property; ROOM-TEMPERATURE; THIN-FILMS; OXIDE; ARRAYS;

D O I：

10.1016/j.apsusc.2011.12.079

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Dense rutile TiO2 nanorods were grown on anatase TiO2 seed layer coated glass substrate by solution technique. The crystalline nature of nanorods has confirmed by transmission electron microscopy. The band gap of the TiO2 seed layer and nanorods were calculated using the UV-vis absorption spectrum and the band gap value of the anatase seed layer and rutile nanorods were 3.39 eV and 3.09 eV respectively. Water contact angle measurements were also made and showed that the contact angle of rutile nanorods was (134 degrees) larger than the seed layer contact angle (93 degrees). The RMS surface roughness of the TiO2 seed layer (0.384 nm) and nanorods film (18.5 nm) were measured by an atomic force microscope and correlated with their contact angle values. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：4283 / 4287

页数：5

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