Layer-by-layer growth of SiO2 films on silicon surfaces

被引:0
|
作者
Hoffmann, H [1 ]
Mayer, U [1 ]
Brunner, H [1 ]
Vallant, T [1 ]
机构
[1] VIENNA TECH UNIV,DEPT INORGAN CHEM,A-1060 VIENNA,AUSTRIA
来源
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 213卷
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中图分类号
O6 [化学];
学科分类号
0703 ;
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页码:180 / PHYS
页数:2
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