Characterization of WO3:Ag films:: ToF-SIMS studies of ammonia adsorption

被引：8
作者：
Bittencourt, C
Felicissimo, MP
Felten, A
Nunes, LAO
Ivanov, P
Llobet, E
Pireaux, JJ
Houssiau, L
机构：
[1] Fac Univ Notre Dame Paix, Lab Interdisciplinaire Spect Electron, B-5000 Namur, Belgium
[2] Univ Sao Paulo, Inst Quim Sao Carlos, BR-13564970 Sao Carlos, SP, Brazil
[3] Univ Sao Paulo, Inst Fis Sao Carlos, BR-13564970 Sao Carlos, SP, Brazil
[4] Univ Rovira & Virgili, Dept Engn Elect, Tarragona 43007, Spain
来源：
APPLIED SURFACE SCIENCE | 2005年 / 250卷 / 1-4期
关键词：
ToF-SIMS; transition metal oxides; semiconductor;
D O I：
10.1016/j.apsusc.2004.12.018
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
In this work, the composition and morphology of WO3 films loaded with different levels of Ag, prepared by screen-printing onto Si substrates and annealed in air were investigated. The TEM micrography showed that the films are grain-like; the grain size increases with the increase of the Ag loading level. The Raman spectroscopy showed the formation of a AgWO3 bronze structure. XPS and ToF-SIMS results showed that while undergoing annealing, the Ag atoms migrate to the surface forming clusters. The molecular images obtained by ToF-SIMS showed that the NH3 binds preferentially at the surface of the Ag clusters. No preferential binding site was found for hydrocarbon contamination. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码：21 / 28
页数：8
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