Comparison of different phonon transport models for predicting heat conduction in silicon-on-insulator transistors

被引:102
作者
Narumanchi, SVJ
Murthy, JY
Amon, CH
机构
[1] Carnegie Mellon Univ, Inst Complex Engn Syst, Pittsburgh, PA 15213 USA
[2] Carnegie Mellon Univ, Dept Mech Engn, Pittsburgh, PA 15213 USA
[3] Purdue Univ, Sch Mech Engn, W Lafayette, IN 47907 USA
来源
JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME | 2005年 / 127卷 / 07期
关键词
computations; BTE; finite volume method; SOI transistors; phonons; phonon dispersion; phonon polarization; micro/nano scale heat conduction; hot spot;
D O I
10.1115/1.1924571
中图分类号
O414.1 [热力学];
学科分类号
摘要
The problem of self-heating in microelectronic devices has begun to emerge as a bottleneck to device performance. Published models for phonon transport in microelectronics have used a gray Boltzmann transport equation (BTE) and do not account adequately for phonon dispersion or polarization. In this study, the problem of a hot spot in a submicron silicon-on-insulator transistor is addressed. A model based on the BTE incorporating full phonon dispersion effects is used. A structured finite volume approach is used to solve the BTE. The results from the full phonon dispersion model are compared to those obtained using a Fourier diffusion model. Comparisons are also made to previously published BTE models employing gray and semi-gray approximations. Significant differences are found in the maximum hot spot temperature predicted by the different models. Fourier diffusion underpredicts the hot spot temperature by as much as 350% with respect to predictions from the full phonon dispersion model. For the full phonon dispersion model, the longitudinal acoustic modes are found to carry a majority of the energy flux. The importance of accounting for phonon dispersion and polarization effects is clearly demonstrated.
引用
收藏
页码:713 / 723
页数:11
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