The application of focused ion beam technology to the characterization of coatings

被引:45
作者
Cairney, JM [1 ]
Munroe, PR [1 ]
Hoffman, M [1 ]
机构
[1] Univ New S Wales, Sydney, NSW 2052, Australia
关键词
focused ion beam; coatings; electron microscopy;
D O I
10.1016/j.surfcoat.2004.10.042
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
An outline of the application of the focused ion beam (FIB) workstation to the characterization of wear-resistant coatings is provided. Specimen preparation difficulties sometimes limit the usefulness of electron microscopy for microstructural characterization of coatings. However, FIB technology overcomes many of these difficulties allowing microstructural characterization to be performed both by cross-sectioning and imaging coatings and by specimen preparation of electron transparent cross-sections for subsequent examination by electron microscopy. In addition, the FIB may be combined with other techniques, such as nanoindentation or wear testing, to obtain further information about the mechanisms governing the performance of the coatings in service. (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:165 / 168
页数:4
相关论文
共 50 条
  • [31] Embossed-carving processing of cytoskeletons of cultured cells by using focused ion beam technology
    Terada, Dohiko
    Hattori, Shinya
    Honda, Takako
    Iitake, Masanori
    Kobayashi, Hisatoshi
    MICROSCOPY RESEARCH AND TECHNIQUE, 2013, 76 (03) : 290 - 295
  • [32] Advances of focused ion beam in micromachining technology - art. no. 67240E
    Zhang, S. J.
    Fang, F. Z.
    Hu, X. T.
    DESIGN, MANUFACTURING, AND TESTING OF MICRO- AND NANO-OPTICAL DEVICES AND SYSTEMS, 2007, 6724 : E7240 - E7240
  • [33] A method for assembling nano-electromechanical devices on microcantilevers using focused ion beam technology
    Nagase, M
    Namatsu, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (7B): : 4624 - 4628
  • [34] FOCUSED ION-BEAM MILLING TECHNOLOGY FOR ON-CHIP WIRING MODIFICATION SYSTEM FOR LSI
    ITOH, F
    SHIMASE, A
    HARAICHI, S
    TAKAHASHI, T
    INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING, 1993, 27 (03): : 209 - 214
  • [35] Carbon multiprobes with nanosprings integrated on Si cantilever using focused-ion-beam technology
    Nagase, M
    Nakamatsu, K
    Matsui, S
    Namatsu, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (7B): : 5409 - 5412
  • [36] Maskless and targeted creation of arrays of colour centres in diamond using focused ion beam technology
    Lesik, Margarita
    Spinicelli, Piernicola
    Pezzagna, Sebastien
    Happel, Patrick
    Jacques, Vincent
    Salord, Olivier
    Rasser, Bernard
    Delobbe, Anne
    Sudraud, Pierre
    Tallaire, Alexandre
    Meijer, Jan
    Roch, Jean-Francois
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2013, 210 (10): : 2055 - 2059
  • [37] Computer-aided manufacturing and focused ion beam technology enable machining of complex micro- and nano-structures
    Niessen, Frank
    Nancarrow, Mitchell J. B.
    NANOTECHNOLOGY, 2019, 30 (43)
  • [38] Focused helium ion beam milling and deposition
    Boden, S. A.
    Moktadir, Z.
    Bagnall, D. M.
    Mizuta, H.
    Rutt, H. N.
    MICROELECTRONIC ENGINEERING, 2011, 88 (08) : 2452 - 2455
  • [39] Focused ion beam assisted etching of aluminum
    Itoh, F
    Azuma, J
    Haraichi, S
    Shimase, A
    INTERNATIONAL JOURNAL OF THE JAPAN SOCIETY FOR PRECISION ENGINEERING, 1995, 29 (03): : 211 - 216
  • [40] Focused-ion-beam processing for photonics
    de Ridder, Rene M.
    Hopman, Wico C. L.
    Ay, Feridun
    ICTON 2007: PROCEEDINGS OF THE 9TH INTERNATIONAL CONFERENCE ON TRANSPARENT OPTICAL NETWORKS, VOL 2, 2007, : 212 - +