Subthreshold Current Modeling of Stacked Dielectric Triple Material Cylindrical Gate All Around (SD-TM-CGAA) Junctionless MOSFET for Low Power Applications

被引:5
作者
Kumar, Prashant [1 ]
Vashisht, Munish [1 ]
Gupta, Neeraj [2 ]
Gupta, Rashmi [3 ]
机构
[1] JC Bose Univ Sci & Technol, YMCA, Dept Elect & Commun Engn, Sect 6, Faridabad 121006, India
[2] Amity Univ Haryana, Dept Elect & Commun Engn, Gurugram 122413, India
[3] Amity Univ Haryana, Dept Comp Sci & Engn, Gurugram 122413, India
关键词
Junctionless MOSFET; Gate material; High-k dielectrics; Subthreshold current; Gate dielectrics; HIGH-K; PERFORMANCE; SIMULATION;
D O I
10.1007/s12633-021-01399-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Stacked Dielectric Triple Material Cylindrical Gate All Around (SD-TM-CGAA) Junctionless MOSFET has been explored for low power applications. This paper presents an analytical model of subthreshold current of Stacked Dielectric Triple Material Cylindrical Gate All Around (SD-TM-CGAA) Junctionless MOSFET. The analytical results are compared with TMSG MOSFET and good agreement was obtained. The sub-threshold current of the device is very low and is considered for the implementation of CMOS inverter. A PMOS transistor is designed and the drive current of the PMOS transistor is tuned with the NMOS device to obtain the ideal matching in the drive current. A CMOS inverter has been designed. The transient and DC behavior of the device have been examined. The power dissipation of the CMOS inverter has been computed and compared with the CMOS DMG-SOI JLT inverter. The power dissipation is found to be 5 times less for the proposed device as compared to the CMOS DMG-SOI JLT inverter. This exhibits an excellent improvement in power dissipation which is useful for making low-power future generation devices.
引用
收藏
页码:6261 / 6269
页数:9
相关论文
共 37 条
[11]   High-K Spacer Dual-Metal Gate Stack Underlap Junctionless Gate All Around (HK-DMGS-JGAA) MOSFET for high frequency applications [J].
Goel, Anubha ;
Rewari, Sonam ;
Verma, Seema ;
Gupta, R. S. .
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2020, 26 (05) :1697-1705
[12]   Shallow Extension Engineered Dual Material Surrounding Gate (SEE-DM-SG) MOSFET for improved gate leakages, analysis of circuit and noise performance [J].
Goel, Anubha ;
Rewari, Sonam ;
Verma, Seema ;
Gupta, R. S. .
AEU-INTERNATIONAL JOURNAL OF ELECTRONICS AND COMMUNICATIONS, 2019, 111
[13]   Temperature-Dependent Gate-Induced Drain Leakages Assessment of Dual-Metal Nanowire Field-Effect Transistor-Analytical Model [J].
Goel, Anubha ;
Rewari, Sonam ;
Verma, Seema ;
Gupta, R. S. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2019, 66 (05) :2437-2445
[14]   2-D Analytical Modeling of Threshold Voltage for Graded-Channel Dual-Material Double-Gate MOSFETs [J].
Goel, Ekta ;
Kumar, Sanjay ;
Singh, Kunal ;
Singh, Balraj ;
Kumar, Mirgender ;
Jit, Satyabrata .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (03) :966-973
[15]   Modeling and simulation of a nanoscale three-region Tri-Material Gate Stack (TRIMGAS) MOSFET for improved carrier transport efficiency and reduced hot-electron effects [J].
Goel, Kirti ;
Saxena, Manoj ;
Gupta, Mridula ;
Gupta, R. S. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2006, 53 (07) :1623-1633
[16]   Electrostatic performance improvement of dual material cylindrical gate MOSFET using work-function modulation technique [J].
Jena, Biswajit ;
Dash, Sidhartha ;
Mishra, Guru Prasad .
SUPERLATTICES AND MICROSTRUCTURES, 2016, 97 :212-220
[17]   An analytical drain current model for graded channel cylindrical/surrounding gate MOSFET [J].
Kaur, Harsupreet ;
Kabra, Sneha ;
Haldar, Subhasis ;
Gupta, R. S. .
MICROELECTRONICS JOURNAL, 2007, 38 (03) :352-359
[18]   Two-dimensional analytical modeling of fully depleted DMG SOI MOSFET and evidence for diminished SCEs [J].
Kumar, MJ ;
Chaudhry, A .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2004, 51 (04) :569-574
[19]   An adjustable work function technology using Mo gate for CMOS devices [J].
Lin, R ;
Lu, Q ;
Ranade, P ;
King, TJ ;
Hu, CM .
IEEE ELECTRON DEVICE LETTERS, 2002, 23 (01) :49-51
[20]   Dual-material gate (DMG) field effect transistor [J].
Long, W ;
Ou, HJ ;
Kuo, JM ;
Chin, KK .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (05) :865-870