Preparation and surface morphology of YBa2Cu3O7-y films by metalorganic chemical vapor deposition block by block deposition using liquid sources

被引：6
作者：
Yoshida, Y [1 ]
Ito, Y
Nagai, H
Takai, Y
Hirabayashi, I
Tanaka, S
机构：
[1] Int Superconduct Technol Ctr, Superconduct Res Lab, Nagoya, Aichi 456, Japan
[2] Nagoya Univ, Dept Elect Engn, Nagoya, Aichi 464, Japan
来源：
PHYSICA C | 1998年 / 302卷 / 01期
关键词：
YBa2Cu3O7-y; thin film; AFM; surface morphology; MOCVD; liquid source; block-by-block method;
D O I：
10.1016/S0921-4534(98)00132-4
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We have recently studied the preparation and the characterization of the films deposited by metalorganic chemical vapor deposition (MOCVD) using liquid state sources [Y. Yoshida, Y. Ito, I. Hirabayashi, H. Nagai, Y, Takai, Appl. Phys, Lett. 69 (1996) 845; Y. Ito, Y. Yoshida, Y. Mizushima, I. Hirabayashi, H. Nagai, Y. Takai, Jpn. J. Appl. Phys. 35 (1996) L825.]. In this paper, we describe the CVD process for the ultra-flat YBCO films block-by-block deposition using liquid sources. The high stability and good controllability of the sources enable us to study the early stage of epitaxial growth by depositing c-axis-oriented films with different number of sequence and different kind of substrates. Investigating the films deposited at 800 degrees C, we confirmed that the initial growth of YBCO films on MgO is multinuclear growth, and in the early stage (t less than or equal to 200 Angstrom), spiral growth appears, whereas that on SrTiO3 is two-dimensional growth and spiral growth appears after coalescence of initially grown crystallites having a flat-faceted surface. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
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页码：31 / 38
页数：8
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