Fates of Hydrogen During Alumina Growth Below Yttria Nodules in FeCrAl(RE) at Low Partial Pressures of Water

被引:7
作者
Babic, Vedad [1 ]
Geers, Christine [1 ]
Jonsson, Bo [1 ,2 ]
Panas, Itai [1 ]
机构
[1] Chalmers Univ Technol, Dept Chem & Chem Engn, SE-41296 Gothenburg, Sweden
[2] Sandvik Heating Technol AB, Hallstahammar, Sweden
基金
瑞典研究理事会;
关键词
High temperature alloy; FeCrAl; Yttria; Alumina; Oxidation by water; Hydride in oxide; Oxygen vacancy; Hydrogen evolution; Confinement effect; Defects; Oxide growth; Low partial pressure of oxygen; N-2; atmosphere; H-2 reducing conditions; ZIRCONIUM OXIDATION; ALPHA-AL2O3;
D O I
10.1007/s12678-017-0368-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Oxidation of FeCrAl(Re), when exposed to similar to 35 ppm of water as sole supply of oxygen in predominantly nitrogen atmosphere, has two characteristic signatures. One is the internal nitridation owing to chromia nodules acting windows toward nitrogen permeation locally short-circuiting the protective alpha-Al2O3 scale. The second remarkable feature is the growth of thick, apparently defect-rich alumina scale under yttria-rich nodules. Hence, one part of the present study comprises exploratory DFT calculations to discriminate between the impacts of chromia and yttria viz. nitrogen permeation. The second part concerns boundary conditions for apparent rapid growth of alumina under yttria nodules. Yttria-associated surface energy stabilization of defect-rich alumina in presence of water was argued to involve hydrolysis-driven hydroxylation of said interface. Subsequent inward growth of the alumina scale was associated with outward diffusion of oxygen vacancies to be accommodated by the remaining proton producing a hydride ion upon surfacing at yttria-decorated alumina interfaces. The latter comprises the cathode process in a quasi-Wagnerian context. Two fates were discussed for this surface ion. One has H--H+ recombination to form H-2 at the interface in conjunction with OH- accommodation upon hydration, while the second allows hydrogen to be incorporated at V-O sites in hydroxylated grain boundaries of the growing alumina scale. The latter was taken to explain the experimentally observed rapid oxide growth under yttria-rich nodules. Space charge due to proton reduction was proposed to cause transient inward cationic drag.
引用
收藏
页码:565 / 576
页数:12
相关论文
共 27 条
[1]   Severe dual atmosphere effect at 600 °C for stainless steel 441 [J].
Alnegren, Patrik ;
Sattari, Mohammad ;
Svensson, Jan-Erik ;
Froitzheim, Jan .
JOURNAL OF POWER SOURCES, 2016, 301 :170-178
[2]  
Babic V., 2017, OXIDATION META UNPUB
[3]   Effect of seeding and water vapor on the nucleation and growth of α-Al2O3 from γ-Al2O3 [J].
Bagwell, RB ;
Messing, GL .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1999, 82 (04) :825-832
[4]   First principles methods using CASTEP [J].
Clark, SJ ;
Segall, MD ;
Pickard, CJ ;
Hasnip, PJ ;
Probert, MJ ;
Refson, K ;
Payne, MC .
ZEITSCHRIFT FUR KRISTALLOGRAPHIE, 2005, 220 (5-6) :567-570
[5]   Structure of the hydrated α-Al2O3 (0001) surface [J].
Eng, PJ ;
Trainor, TP ;
Brown, GE ;
Waychunas, GA ;
Newville, M ;
Sutton, SR ;
Rivers, ML .
SCIENCE, 2000, 288 (5468) :1029-1033
[6]   Properties of Alumina/Chromia Scales in N2-Containing Low Oxygen Activity Environment Investigated by Experiment and Theory [J].
Geers, Christine ;
Babic, Vedad ;
Mortazavi, Nooshin ;
Halvarsson, Mats ;
Jonsson, Bo ;
Johansson, Lars-Gunnar ;
Panas, Itai ;
Svensson, Jan-Erik .
OXIDATION OF METALS, 2017, 87 (3-4) :321-332
[7]   INHOMOGENEOUS ELECTRON-GAS [J].
RAJAGOPAL, AK ;
CALLAWAY, J .
PHYSICAL REVIEW B, 1973, 7 (05) :1912-1919
[8]   Effects of minor additions and impurities on oxidation behaviour of FeCrAl alloys. Development of novel surface coatings compositions [J].
Kochubey, V ;
Al-Badairy, H ;
Tatlock, G ;
Le-Coze, J ;
Naumenko, D ;
Quadakkers, WJ .
MATERIALS AND CORROSION-WERKSTOFFE UND KORROSION, 2005, 56 (12) :848-853
[9]  
Kofstad P., 1988, HIGH TEMPERATURE COR, P162
[10]   SELF-CONSISTENT EQUATIONS INCLUDING EXCHANGE AND CORRELATION EFFECTS [J].
KOHN, W ;
SHAM, LJ .
PHYSICAL REVIEW, 1965, 140 (4A) :1133-&