Angular distribution of the sputtered atoms from UO2 under high electronic stopping power irradiation

被引：23

作者：

Bouffard, S

Duraud, JP

Mosbah, M

Schlutig, S

机构：

[1] CEA, CIRIL, Ctr Interdisciplinaire Rech Ions Lourds, CNRS, F-14070 Caen 5, France

[2] CEA Saclay, LPS, Lab Pierre Sue, CNRS, F-91191 Gif Sur Yvette, France

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1998年 / 141卷 / 1-4期

关键词：

sputtering; heavy ion irradiation; UO2;

D O I：

10.1016/S0168-583X(98)00170-0

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

This study deals with the sputtering of uranium atoms from UO2 surfaces, induced by high U-238(15+) and Sn-116(36+) irradiation. The sputtered uranium atoms were collected on mica energy foils which were subsequently irradiated with thermal neutrons in order to fission the U-235. The fission fragments created latent tracks in mica which were revealed by chemical etching. Finally, we determined the track densities as a function of the emission angle in the mica detectors using three microscopy techniques: optical microscopy, SEM and AFM. The total yield of uranium emission and the angular distribution are given for both projectiles. (C) 1998 Elsevier Science B.V. All rights reserved.

引用

页码：372 / 377

页数：6

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