Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy

We evaluated structural changes in silica glass induced by ion microbeam using microscopic photoluminescence (PL) and Raman scattering measurements. Microbeams (1.7 MeV H+) were scanned over the sharp right-edges of the silica substrates with a fluence of I x 10(17) cm(-2), then two PL bands of silica at 540 and 650 nm were observed at the irradiated region. The PL bands show different lateral and depth distributions. The distribution of the 540 nm PL is in good agreement with that of the refractive index changed region. The lateral distribution of the 650 nm band is broader by 1.5 times than those of the 540 nm PL and the refractive index changed region. The microscopic Raman scattering measurements show an increased intensity of 606 cm(-1) peak associated with compaction at the microbeam irradiated regions. (C) 2003 Elsevier B.V. All rights reserved.