Effect of temperature of annealing on optical, structural and electrochromic properties of sol-gel dip coated molybdenum oxide films

被引：75
作者：
Dhanasankar, M. [2 ]
Purushothaman, K. K. [3 ]
Muralidharan, G. [1 ]
机构：
[1] Deemed Univ, Gandhigram Rural Inst, Dept Phys, Gandhigram 624302, India
[2] Kamaraj Coll Engn & Technol, Dept Phys, Virudunagar 626001, India
[3] TRP Engn Coll, SRM Grp, Dept Phys, Irungalur, Trichy, India
来源：
APPLIED SURFACE SCIENCE | 2011年 / 257卷 / 06期
关键词：
Electrochromism; MoO3; Thin films; Sol-gel dip coating; MOO3; THIN-FILMS; NANORODS; SUBSTRATE; BEHAVIOR;
D O I：
10.1016/j.apsusc.2010.09.052
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The sol-gel dip-coating method is used for the preparation of MoO3 thin films. The 6 layered MoO3 films were prepared and annealed at various temperatures in the range of 200-350 degrees C. The band gap value for MoO3 films were calculated from optical absorption measurements and it is in the range of 3.55-3.73 eV. XRD spectrum reveals (0 2 0) is the major diffraction plane for the films prepared above 250 degrees C, which reveals the formation of MoO3 in alpha-orthorhombic phase. The films prepared at 200 degrees C and 250 degrees C exhibits amorphous nature. The FTIR spectrum confirms the presence of Mo-O-Mo and Mo=O bonds. Nanorods were observed in the SEM images in the case of MoO3 films prepared above 250 degrees C. The films prepared at 250 degrees C exhibit maximum anodic diffusion coefficient of 9.61x10(-11) cm(2)/s. The same film exhibits the change in optical transmission of 58.4% at 630nm with the optical density of 0.80. (C) 2010 Elsevier B.V. All rights reserved.
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页码：2074 / 2079
页数：6
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