P-type Doping in Large-Area Monolayer MoS2 by Chemical Vapor Deposition

被引:171
作者
Li, Mengge [1 ,2 ]
Yao, Jiadong [1 ,2 ]
Wu, Xiaoxiang [1 ,2 ]
Zhang, Shucheng [1 ,2 ]
Xing, Boran [1 ,2 ]
Niu, Xinyue [1 ,2 ]
Yan, Xiaoyuan [1 ,2 ]
Yu, Ying [1 ,2 ]
Liu, Yali [1 ,2 ]
Wang, Yewu [1 ,2 ,3 ]
机构
[1] Zhejiang Univ, Dept Phys, Zhejiang Prov Key Lab Quantum Technol & Device, Hangzhou 310027, Peoples R China
[2] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
[3] Nanjing Univ, Collaborat Innovat Ctr Adv Microstruct, Nanjing 210093, Peoples R China
基金
中国国家自然科学基金;
关键词
MoS2; CVD; substitutional doping; DFT calculation; ambipolar; LAYER MOS2; TRANSITION; GROWTH; FILMS; PHOTOLUMINESCENCE; ENHANCEMENT; TRANSISTORS;
D O I
10.1021/acsami.9b19864
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Molybdenum disulfide (MoS2) with excellent properties has been widely reported in recent years. However, it is a great challenge to achieve p-type conductivity in MoS2 because of its native stubborn n-type conductivity. Substitutional transition metal doping has been proved to be an effective approach to tune their intrinsic properties and enhance device performance. Herein, we report the growth of Nb-doping large-area monolayer MoS2 by a one-step salt-assisted chemical vapor deposition method. Electrical measurements indicate that Nb doping suppresses n-type conductivity in MoS2 and shows an ambipolar transport behavior after annealing under the sulfur atmosphere, which highlights the p-type doping effect via NU, corresponding to the density functional theory calculations with Fermi-level shifting to valence band maximum. This work provides a promising approach of two-dimensional materials in electronic and optoelectronic applications.
引用
收藏
页码:6276 / 6282
页数:7
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