Preparation, morphology, and ultra-low dielectric constants of benzoxazine-based polymers/polyhedral oligomeric silsesquioxane (POSS) nanocomposites

被引：92
作者：
Tseng, Min-Chi
Liu, Ying-Ling [1 ]
机构：
[1] Chung Yuan Christian Univ, Dept Chem Engn, Chungli 32023, Taoyuan, Taiwan
来源：
POLYMER | 2010年 / 51卷 / 23期
关键词：
Benzoxazine; Dielectric properties; Nanocomposites; POLYMERIZATION; POLYMERS; MONOMERS; FILMS; POLYBENZOXAZINE; NANOPORES; RESINS;
D O I：
10.1016/j.polymer.2010.09.040
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Nanocomposites of benzoxazine-based polymers/polyhedral oligomeric silsesquioxane (PUSS) have been prepared through copolymerization of furan-containing benzoxazine compounds and methyl-methacrylate-POSS (MMA-POSS). Nanocomposites having MMA-POSS fractions of 0-70 wt% (PUSS fractions of 0-28 wt%) are obtained. The high contents of MMA-POSS of the nanocomposites result in a reduction of their dielectric constants to 2.3. Moreover, some nanocomposites display PUSS orientation into lamellar structures in nanometer sizes. The PUSS orientation further reduces the dielectric constants of the nanocomposites to about 1.9. Hence, the prepared nanocomposites could be used as ultra-low-k materials for advanced microelectronics. (C) 2010 Elsevier Ltd. All rights reserved.
引用
收藏
页码：5567 / 5575
页数：9
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