Experimental analysis of the effect of metal thickness on the quality factor in integrated spiral inductors for RF ICs

被引：46
|
作者：
Choi, YS [1 ]
Yoon, JB [1 ]
机构：
[1] Korea Adv Inst Sci & Technol, Div Elect Engn, Dept Elect Engn & Comp Sci, Taejon 305701, South Korea
来源：
IEEE ELECTRON DEVICE LETTERS | 2004年 / 25卷 / 02期
关键词：
integrated micromachined inductor; metal thickness; micromachining; Q-factor; radio frequency (RF) ICs; resistance; RF MEMS;
D O I：
10.1109/LED.2003.822652
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The effect of metal thickness on the quality (Q-) factor of the integrated spiral inductor is investigated in this paper. The inductors with metal thicknesses of 5 similar to 22.5 mum were fabricated on the standard silicon substrate of 1 similar to 30 Omega (.) cm in resistivity by using thick-metal surface micromachining technology. The fabricated inductors were measured at GHz ranges to extract their major parameters (Q-factor, inductance, and resistance). From the experimental analysis assisted by FEM simulation, we first reported that the metal thickness' effect on the Q-factor strongly depends on the innermost turn diameter of the spiral inductor, so that it is possible to improve Q-factors further by increasing the metal thickness beyond 10 mum.
引用
收藏
页码：76 / 79
页数：4
相关论文
共 50 条
  • [41] Modeling and analysis of spiral inductors for Si-based RF IC's
    Jiang, Qi-Feng
    Li, Zheng-Fan
    2002, Chinese Institute of Electronics (30):
  • [42] Analysis, design, and optimization of spiral inductors and transformers for Si RF IC's
    Niknejad, AM
    Meyer, RG
    IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1998, 33 (10) : 1470 - 1481
  • [43] Investigation of On-Chip Soft-Ferrite-Integrated Inductors for RF ICs-Part II: Experiments
    Yang, Chen
    Liu, Feng
    Wang, Xin
    Zhan, Jing
    Wang, Albert
    Ren, Tian-Ling
    Liu, Li-Tian
    Long, Haibo
    Wu, Zhengzheng
    Li, Xinxin
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2009, 56 (12) : 3141 - 3148
  • [44] Quality factor of planar spiral inductors at frequencies up to self-resonance
    Jankovskis, J
    BEC 2002: PROCEEDINGS OF THE 8TH BIENNIAL BALTIC ELECTRONIC CONFERENCE, 2002, : 391 - 394
  • [45] ANALYSIS OF QUALITY FACTOR OF ANNULAR CORE INDUCTORS
    LEGG, VE
    BELL SYSTEM TECHNICAL JOURNAL, 1960, 39 (01): : 105 - 126
  • [46] Efficient impedance calculation for RF CMOS spiral inductors incorporating eddy currents effect
    Institute of Microelectronics, Tsinghua University, Beijing 100084, China
    不详
    不详
    Tien Tzu Hsueh Pao, 2006, 8 (1361-1366):
  • [47] CMOS-compatible surface-micromachined suspended-spiral inductors for multi-GHz silicon RF ICs
    Yoon, JB
    Choi, YS
    Kim, BI
    Eo, Y
    Yoon, E
    IEEE ELECTRON DEVICE LETTERS, 2002, 23 (10) : 591 - 593
  • [48] Analytical calculation for DC inductances of rectangular spiral inductors with finite metal thickness in the PEEC formulation
    Kuo, JT
    Su, KY
    Liu, TY
    Chen, HH
    Chung, SJ
    IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, 2006, 16 (02) : 69 - 71
  • [49] Systematic analysis and modeling of integrated inductors and transformers in RF IC design
    Koutsoyannopoulos, YK
    Papananos, Y
    IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS II-EXPRESS BRIEFS, 2000, 47 (08) : 699 - 713
  • [50] Tunable MEMS Spiral Inductors With Optimized RF Performance and Integrated Large-Displacement Electrothermal Actuators
    Kim, Jeong-Il
    Peroulis, Dimitrios
    IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES, 2009, 57 (09) : 2276 - 2283
12345