Large area ultraviolet photodetector on surface modified Si:GaN layers

被引：27

作者：

Anitha, R. ^{[1
]}

Ramesh, R. ^{[2
]}

Loganathan, R. ^{[3
]}

Vavilapalli, Durga Sankar ^{[1
]}

Baskar, K. ^{[1
,4
]}

Singh, Shubra ^{[1
]}

机构：

[1] Anna Univ, Crystal Growth Ctr, Madras 600025, Tamil Nadu, India

[2] Hunan Univ, Coll Phys & Microelect, Changsha 410082, Hunan, Peoples R China

[3] CENCON, Hindustan Inst Technol & Sci, Madras, Tamil Nadu, India

[4] Manonmaniam Sundaranar Univ, Tirunelveli 627012, Tamil Nadu, India

来源：

APPLIED SURFACE SCIENCE | 2018年 / 435卷

关键词：

UV photodetector; Heterostructure; Si-GaN; ZnO; Thin film; ZNO/GAN HETEROSTRUCTURES; ELECTRICAL-PROPERTIES; UV PHOTODETECTORS; ZINC-OXIDE; ZNO; RESPONSIVITY; DETECTORS; HETEROJUNCTION; NANOPARTICLES; DEPOSITION;

D O I：

10.1016/j.apsusc.2017.11.097

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Unique features of semiconductor based heterostructured photoelectric devices have drawn considerable attention in the recent past. In the present work, large area UV photodetector has been fabricated utilizing interesting Zinc oxide microstructures on etched Si:GaN layers. The surface of Si:GaN layer grown by metal organic chemical vapor deposition method on sapphire has been modified by chemical etching to control the microstructure. The photodetector exhibits response to Ultraviolet light only. Optimum etching of Si:GaN was required to exhibit higher responsivity (0.96 A/W) and detectivity (similar to 4.87 x 10(9) Jones), the two important parameters for a photodetector. Present method offers a tunable functionality of photodetector through modification of top layer microstructure. A comparison with state of art materials has also been presented. (c) 2017 Elsevier B.V. All rights reserved.

引用

页码：1057 / 1064

页数：8

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