Microstructure and mechanical properties of VN/SiO2 nanomultilayers synthesized by reactive sputtering

被引：17

作者：

Yue, Jianling ^{[1
,2
]}

Zhao, Wenji ^{[1
]}

Li, Geyang ^{[1
]}

Gao, Wei ^{[2
]}

机构：

[1] Shanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Shanghai 200030, Peoples R China

[2] Univ Auckland, Sch Engn, Auckland 1, New Zealand

来源：

MATERIALS LETTERS | 2008年 / 62卷 / 10-11期

基金：

中国国家自然科学基金;

关键词：

coatings; epitaxial growth; hardness;

D O I：

10.1016/j.matlet.2007.09.040

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

VN/SiO2 nanomultilayers with various individual SiO2 and VN layer thickness were prepared by reactive sputtering process. The crystallization condition of the SiO2 layers and how they influence the characteristics of the multilayers were studied. The results reveal that under the template effect of the crystalline VN layer, as-deposited amorphous SiO2 crystallizes at very low thickness (<similar to 1 nm), and then grows epitaxially with VN layer in the VN/SiO2 nanomultilayers. This leads to a remarkable increase in hardness. If the SiO2 layers' thickness is further increased, they gradually transform into amorphous structure and block the epitaxial growth of the multilayers, resulting in a quick decline in hardness. On the other hand, the hardness of the multilayers is not sensitive to the VN layer thickness. (c) 2007 Elsevier B.V. All rights reserved.

引用

页码：1621 / 1623

页数：3

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