Gd plasma source modeling at 6.7nm for future lithography

被引:34
作者
Li, Bowen [1 ]
Dunne, Padraig [1 ]
Higashiguchi, Takeshi [2 ,3 ,4 ]
Otsuka, Takamitsu [2 ,3 ]
Yugami, Noboru [2 ,3 ,4 ]
Jiang, Weihua [5 ]
Endo, Akira [6 ]
O'Sullivan, Gerry [1 ]
机构
[1] Univ Coll Dublin, Sch Phys, Dublin 4, Ireland
[2] Utsunomiya Univ, Dept Adv Interdisciplinary Sci, CORE, Utsunomiya, Tochigi 3218585, Japan
[3] Utsunomiya Univ, OpTIC, Utsunomiya, Tochigi 3218585, Japan
[4] Japan Sci & Technol Agcy, CREST, Kawaguchi, Saitama 3320012, Japan
[5] Nagaoka Univ Technol, Dept Elect Engn, Nagaoka, Niigata 9402188, Japan
[6] Waseda Univ, Res Inst Sci & Engn, Shinjuku Ku, Tokyo 1690072, Japan
基金
爱尔兰科学基金会;
关键词
LASER-PRODUCED PLASMAS; EMISSION; SPECTRA;
D O I
10.1063/1.3666042
中图分类号
O59 [应用物理学];
学科分类号
摘要
Plasmas containing gadolinium have been proposed as sources for next generation lithography at 6.x nm. To determine the optimum plasma conditions, atomic structure calculations have been performed for Gd11+ to Gd27+ ions which showed that n = 4 - n = 4 resonance transitions overlap in the 6.5-7.0 nm region. Plasma modeling calculations, assuming collisional-radiative equilibrium, predict that the optimum temperature for an optically thin plasma is close to 110 eV and that maximum intensity occurs at 6.76 nm under these conditions. The close agreement between simulated and experimental spectra from laser and discharge produced plasmas indicates the validity of our approach. (C) 2011 American Institute of Physics. [doi:10.1063/1.3666042]
引用
收藏
页数:3
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