A ferromagnetic oxide semiconductor as spin injection electrode in magnetic tunnel junction

被引:41
作者
Toyosaki, H
Fukumura, T [1 ]
Ueno, K
Nakano, M
Kawasaki, M
机构
[1] Tohoku Univ, Mat Res Inst, Sendai, Miyagi 9808577, Japan
[2] Natl Inst Mat Sci, COMET, Tsukuba, Ibaraki 3050044, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2005年 / 44卷 / 28-32期
关键词
tunneling magnetoresistance; ferromagnetic semiconductor; Co-doped TiO2; magnetic tunnel junction; wide gap semiconductor; oxide semiconductor;
D O I
10.1143/JJAP.44.L896
中图分类号
O59 [应用物理学];
学科分类号
摘要
A magnetic tunnel junctions composed of room temperature ferromagnetic semiconductor rutile Ti1-xCOxO2-delta and ferromagnetic metal Fe0.1Co0.9 separated by AlOx barrier showed positive tunneling magnetoresistance (TMR) with a ratio of similar to 11% at 15K, indicating that Ti1-xCoxO2-delta can be used as a spin injection electrode. The TMR decreased with increasing temperature and vanished above 180K. TMR action at high temperature is likely prohibited by the inelastic tunneling conduction due to the low quality of the amorphous barrier layer and/or the junction interface.
引用
收藏
页码:L896 / L898
页数:3
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