Nanoscale Patterning of Organosilane Molecular Thin Films from the Gas Phase and Its Applications: Fabrication of Multifunctional Surfaces and Large Area Molecular Templates for Site-Selective Material Deposition

被引：23

作者：

George, Antony

Knez, Mato ^{[2
]}

Hlawacek, Gregor ^{[1
]}

Hagedoorn, Daniel

Verputten, Hein H. J.

van Gastel, Raoul ^{[1
]}

ten Elshof, Johan E. ^{[1
]}

机构：

[1] Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands

[2] Max Planck Inst Microstruct Phys, D-06120 Halle, Saale, Germany

来源：

LANGMUIR | 2012年 / 28卷 / 05期

关键词：

SELF-ASSEMBLED MONOLAYERS; ATOMIC LAYER DEPOSITION; FUNCTIONAL MATERIALS; LITHOGRAPHY; NANOFABRICATION; RESIST;

D O I：

10.1021/la204437r

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A simple methodology to fabricate micrometer- and nanometer-scale patterned surfaces with multiple chemical functionalities is presented. Patterns with lateral dimensions down to 110 nm were made. The fabrication process involves multistep gas-phase patterning of amine, thiol, alkyl, and fluorinated alkyl-functional organosilane molecules using PDMS molds as shadow masks. Also, a combination process of channel diffused plasma etching of organosilane molecular thin films in combination with masked gas-phase deposition to fabricate multilength scale, multifunctional surfaces is demonstrated.

引用

收藏

页码：3045 / 3052

页数：8

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