Morphology, magnetic, magnetoresistance and optical properties of Co-Ni-Mo alloys thin films

被引：17

作者：

Tanase, S. I. ^{[1
,2
]}

Tanase, D. Pinzaru ^{[1
]}

Dobromir, M. ^{[1
]}

Georgescu, V. ^{[1
]}

机构：

[1] Alexandru Ioan Cuza Univ, Fac Phys, Iasi 700506, Romania

[2] Alexandru Cel Bun Coll, Dept Phys, Gura Humorului 725300, Romania

来源：

APPLIED SURFACE SCIENCE | 2011年 / 257卷 / 24期

关键词：

Co-Ni alloy; Thin films; Magnetic properties; Magnetoresistance; ELECTRODEPOSITION; DEPOSITION; COATINGS; MEMS; CR;

D O I：

10.1016/j.apsusc.2011.07.139

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We present in this paper several results concerning the preparation by means of electrolysis and characterization of Co-Ni-Mo thin films. Co-Ni-Mo thin films with different molybdenum content in the range 0-25 at% Mo were prepared from a complex solution containing ions of Co, Ni and Mo, using galvanostatic control, on aluminum substrates. The effects of applied current density on the morphology, magnetic, magnetoresistance, and optical properties of the electrodeposited Co-Ni-Mo films were investigated. The applied current density significantly influenced the film composition and their magnetic properties. The increase of molybdenum content in Co-Ni films (up to 25 at% Mo) enhances the resistivity, but it reduces the magnetoresistance effect. We report the first observation of magnetoresistance as high as 8% in Co-Ni-Mo thin films. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：10903 / 10909

页数：7

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