Compositional study of vacuum annealed Al doped ZnO thin films obtained by RF magnetron sputtering

被引：20
作者：
Shantheyanda, B. P. [2 ]
Todi, V. O. [2 ]
Sundaram, K. B. [2 ]
Vijayakumar, A. [1 ]
Oladeji, I. [1 ]
机构：
[1] Planar Energy Inc, Orlando, FL 32805 USA
[2] Univ Cent Florida, Dept Elect Engn & Comp Sci, Orlando, FL 32816 USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2011年 / 29卷 / 05期
关键词：
ZINC-OXIDE FILMS; CHEMICAL-VAPOR-DEPOSITION; TRANSPARENT CONDUCTING FILMS; SOL-GEL PROCESS; STRUCTURAL-PROPERTIES; OPTICAL-PROPERTIES; TEMPERATURE; PLASMA; OXYGEN; TARGET;
D O I：
10.1116/1.3624787
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Aluminum doped zinc oxide (AZO) thin films were obtained by RF magnetron sputtering. The effects of deposition parameters such as power, gas flow conditions, and substrate heating have been studied. Deposited and annealed films were characterized for composition as well as microstructure using x ray photoelectron spectroscopy and x ray diffraction. Films produced were polycrystalline in nature. Surface imaging and roughness studies were carried out using SEM and AFM, respectively. Columnar grain growth was predominantly observed. Optical and electrical properties were evaluated for transparent conducting oxide applications. Processing conditions were optimized to obtain highly transparent AZO films with a low resistivity value of 6.67 x 10(-4) Omega cm. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3624787]
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页数：9
相关论文
共 46 条
  • [1] Efforts to improve carrier mobility in radio frequency sputtered aluminum doped zinc oxide films
    Agashe, C
    Kluth, O
    Hüpkes, J
    Zastrow, U
    Rech, B
    Wuttig, M
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 95 (04) : 1911 - 1917
  • [2] Preparation and properties of transparent conductive aluminum-doped zinc oxide thin films by sol-gel process
    Alam, MJ
    Cameron, DC
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (04): : 1642 - 1646
  • [3] Recent development on surface-textured ZnO:Al films prepared by sputtering for thin-film solar cell application
    Berginski, M.
    Huepkes, J.
    Reetz, W.
    Rech, B.
    Wuttig, M.
    [J]. THIN SOLID FILMS, 2008, 516 (17) : 5836 - 5841
  • [4] Carlin J.F., 2006, United States Geological Survey Circular 1196-Q
  • [5] Al-doped zinc oxide films deposited by simultaneous rf and dc excitation of a magnetron plasma: Relationships between plasma parameters and structural and electrical film properties
    Cebulla, R
    Wendt, R
    Ellmer, K
    [J]. JOURNAL OF APPLIED PHYSICS, 1998, 83 (02) : 1087 - 1095
  • [6] X-ray photoelectron spectroscopy and auger electron spectroscopy studies of Al-doped ZnO films
    Chen, M
    Wang, X
    Yu, YH
    Pei, ZL
    Bai, XD
    Sun, C
    Huang, RF
    Wen, LS
    [J]. APPLIED SURFACE SCIENCE, 2000, 158 (1-2) : 134 - 140
  • [7] TRANSPARENT CONDUCTORS - A STATUS REVIEW
    CHOPRA, KL
    MAJOR, S
    PANDYA, DK
    [J]. THIN SOLID FILMS, 1983, 102 (01) : 1 - 46
  • [8] DAWAR AL, 1984, J MATER SCI, V19, P1, DOI 10.1007/BF02403106
  • [9] EFFECTS OF OXYGEN-CONTENT ON THE OPTICAL-PROPERTIES OF TANTALUM OXIDE-FILMS DEPOSITED BY ION-BEAM SPUTTERING
    DEMIRYONT, H
    SITES, JR
    GEIB, K
    [J]. APPLIED OPTICS, 1985, 24 (04): : 490 - 495
  • [10] ZnO thin film deposition by laser ablation of Zn target in oxygen reactive atmosphere
    Dinescu, M
    Verardi, P
    [J]. APPLIED SURFACE SCIENCE, 1996, 106 : 149 - 153
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